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Quadrio α

Quadrio α - High Volume Plasma System

Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor

Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.

Product Features:
Quadrio α comes in two versions:
  • Quadrioα 4 with 4 tracks, 400 UPH*
  • Quadrioα 5 with 5 tracks, 500 UPH*
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SCI has a dedicated engineering team that will evaluate your requirements. With our technical experience and knowledge, we are able to provide you professional solutions and customized equipment that will improve your process. If you need information that is not available on this web site, please feel free to send us your request. Our sales department will contact you.