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Quadrio α - High Volume Plasma System
Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor
Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.
Quadrio α comes in two versions:
Quadrioα 4 with 4 tracks, 400 UPH*
Quadrioα 5 with 5 tracks, 500 UPH*