Quadrio Alpha

High Volume Plasma System

Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor

Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.


Product Features: Quadrio α comes in two versions:

Quadrio α4 with 4 tracks, 400 UPH*

Quadrio α5 with 5 tracks, 500 UPH*




*Throughput capability is measured with 10 sec plasma time.