High Volume Plasma System
Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor
Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.
Product Features: Quadrio α comes in two versions:
Quadrio α4 with 4 tracks, 400 UPH*
Quadrio α5 with 5 tracks, 500 UPH*
*Throughput capability is measured with 10 sec plasma time.