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JUNO

Batch Plasma System

Juno is a flexible standalone batch plasma cleaning system. Juno’s chamber can accommodate a variable number of shelves, this allows the flexibility of handling multiple hybrid substrates.

For plasma cleaning on lead frames in magazines check our Titan plasma cleaner.


Applications

Juno can perform all plasma processes such:

  • Plasma cleaning

  • Plasma activation

  • Plasma surface treatment on polymers

Juno is used for standard applications in the semiconductors, automotive and medical industries.


Features

  • Reactive Ion Etching (RIE) or Plasma Etching (Direct Plasma) processes

  • Plasma chamber in aluminum or stainless steel AISI304

  • 600 W RF generator at 13.56 MHz

  • Capacitive pressure gauge

  • 1000 L/min dry vacuum pump with low maintenance downtime

  • 2 Mass-flow-controlled gas lines for standard plasma gases (Ar, He, O2, N2...)

  • PC based automation (Windows® 10)


Options

  • Hydrogen kit for 100% pure H2 process with dedicated external hydrogen generator

  • High power RF generator 1000 W

  • Up to 2 more additional mass-flow-controlled gas lines (total 4)

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