Batch Plasma System
Juno is a flexible standalone batch plasma cleaning system. Juno’s chamber can accommodate a variable number of shelves, this allows the flexibility of handling multiple hybrid substrates.
For plasma cleaning on lead frames in magazines check our Titan plasma cleaner.
Juno can perform all plasma processes such:
Plasma surface treatment on polymers
Juno is used for standard applications in the semiconductors, automotive and medical industries.
Reactive Ion Etching (RIE) or Plasma Etching (Direct Plasma) processes
Plasma chamber in aluminum or stainless steel AISI304
600 W RF generator at 13.56 MHz
Capacitive pressure gauge
1000 L/min dry vacuum pump with low maintenance downtime
2 Mass-flow-controlled gas lines for standard plasma gases (Ar, He, O2, N2...)
PC based automation (Windows® 10)
Hydrogen kit for 100% pure H2 process with dedicated external hydrogen generator
High power RF generator 1000 W
Up to 2 more additional mass-flow-controlled gas lines (total 4)