TITAN
Batch Plasma System
Titan is a standalone batch plasma cleaning system. Titan's chamber can accommodate specifically 6 magazines containing lead frames with a maximum dimension of 310 x 110 x 220 mm (L xW x H). This system has been designed to process batches of lead frames in magazines allowing:
No hotspots
No burnt marks
Optimal plasma distribution that guarantees repeatable and formidable plasma cleaning results
Titan has been presented on the market in the early 2010s and has been consistently delivering millions of parts for the semiconductor industry.
Applications
Titan is designed to perform plasma processes such:
Plasma cleaning
Plasma activation
Pre-wire bonding plasma
Pre-molding plasma
Titan is mostly used for standard applications in the semiconductors industry.
Titan works well for pre-molding applications where automated system may interfere with the thin wires mounted on the lead frames.
Features
Plasma Etching (Direct Plasma) process
Plasma chamber in aluminum or stainless steel AISI304
600 W RF generator at 13.56 MHz
Capacitive pressure gauge
1000 L/min dry vacuum pump with low maintenance downtime
2 Mass-flow-controlled gas lines for standard plasma gases (Ar, He, O2, N2...)
PC based automation (Windows® 10)
Options
Hydrogen kit for 100% pure H2 process with dedicated external hydrogen generator
High power RF generator 1000 W
Up to 2 more additional mass-flow-controlled gas lines (total 4)